Chromatography Forum

Hi all,

I have just bought a CP-Wax 57 CB, which has a maximum isothermal operating temperature of 200C and maximum programmed one of 225C. In the same GC oven I will have an HP-FFAP, on which I run an analysis with a final hold at 210C for 5 minutes. The overall analysis time on the FFAP is 25 minutes and I can run up to 15 samples a day (although not every day).

As far as I understand, the Wax can be taken for a short time at 225C but I am not sure of how frequently this can be done before damage to the phase occurs. Can the Wax sustain short but repeated exposures at 210C or do I really need to stick to 200C?

Looking forward to hearing your opinions.

My opinion/guess is you are OK taking the Wax column repeatedly to 210 C for 5 min since the max temp is 225 C. I would make sure that in my FFAP method that I have carrier flow going through my Wax column.

That was my understanding too but as it is a new column, I wanted to double check before I do something daft. I will make sure that there is enough flow going through.

Many thanks!