by
LALman » Fri Jul 14, 2017 9:53 pm
Yes, I have my lab plumbed for Argon because I have an abundance from keeping a dewar for ICP-MS use. So, to save Helium, I use Argon for purging 11 minutes as per method then I dry purge for 1 minute using UHP Hydrogen and bake out is 8 minutes using hydrogen. I do the dry purge with hydrogen to reduce the amount of Argon that gets into my 5973 MS because Argon quenches MS response and being easier to ionize than Helium; it also messes with fragmentation mass ratios.
[Edit]: Essentially, the Archon is plumbed with Argon (or Nitrogen at the moment) from a dewar and the Tekmar 3000 is plumbed with Hydrogen. The GC-MS is plumbed with Helium.[/edit]
I've been operating sucessfully with these conditions for many years. I was actually using hydrogen as my carrier gas for a few years until I had a power failure that caused the 6890 EPC to back flow water and pump oil vapor (power failure makes the EPC fail open) which irreversibly contaminated the system. Even after a thorough cleaning and swapping in a different EPC and weldment. So no more hydrogen carrier for me and went back to helium.
With that background explained. It sounds like the Tekmar 3000 bake out path got thoroughly cleaned by the hydrogen and that pathway which is exposed during desorb is presenting active sites that are getting the vinyl chloride. And you think that is the best explanation and not that the trap contents were damaged by the bake out?
Its good to know I can probably eliminate the trap as a suspect. I think perhaps I can blame the variability of my dibromomethane surrogate recovery at the same door. Dibromomethane recovers within limits on CC and dirty samples but is recovering at the very low QC limits occasionally failing in method blanks and clean samples.