-
- Posts: 19
- Joined: Mon Feb 06, 2012 9:53 pm
I need to develop a method to quantify low levels of impurities in a certain compound. I know the impurities have the same response factor so I am going with a purity based on simple peak area %.
The column I found that is able to separate the components unfortunately seems to be responsible for high baseline noise compared with other columns with all other parameters unchanged. I found that if using 210nm (near max absorption), I cannot detect any of the impurities. However, if I use the smaller max (290nm), the response is significantly lower, less than 10% of the lower wavelength signal, but I am able to detect and quantify the impurities. The amount of material I load onto the column ends up saturating the detector at 210nm but is within the linear range at 290nm (peak shapes do not suffer) to get a nice strong signal at 290nm with good S/N.
Monitoring a weakly absorbing wavelength to reduce S/N while saturating the max wavelength seems a bit unconventional, and I worry that I'm missing out on something that could be giving me unreliable data despite that I checked the linearity of the wavelength I use and the peak shapes are good. Does anyone have any thoughts on this?
Thanks,
dja
