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general cleaning method validation using UV/Vis

Discussions about GC-MS, LC-MS, LC-FTIR, and other "coupled" analytical techniques.

3 posts Page 1 of 1
Hi, All,
I have been using HPLC to perform cleaning validation and verification. To save time, I would like to use UV/Vis as a means to detect residue at a very low level, but do not know how to proceed. If you know any general cleaning method validation, please help.
Thanks,
Ngoc Truong
ntruong

Use a short small diameter column (with small particles) and a rapid gradient - as fast as your system lets you. More can be said once we know the capabilities of your system.

Thanks for your promptly response, Uwe.
Sorry for taking this long since I have asked for help. I was kind of busy dealing with other issues at hand...and didn't have a chance to reponse. :oops:
My boss has wanted me to develop and validate a general cleaning method validation using UV/Vis, not HPLC. To be honest, I have never used this instrument even we have one in the lab for 7 years (been collecting dirt)
I searched online and found a lot of literatures talked about using UV/Vis in cleaning, but couldn't find any literature specifically mentioned what validation parameters I should use. I was thinking about LOQ, recovery at limit level, and linearity.
If someone have any better ideas, I would appreciate your inputs.
Thanks in advance,
ntruong
3 posts Page 1 of 1

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