Random Baseline Jump

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Hello all,

Running a method on a Dionex ICS-3000 using an ASRS Suppressor and an automatic Eluent Generator. Was running conditioning injections, and everything seemed fairly stable (baseline was holding at roughly 26 micro siemens). However, at the end of the 14th injection, the baseline jumped to around 27.5 micro siemens. It changed the peak area in the compound of interest by roughly a tenth. I though maybe it was a bubble going through the line, but more conditioning injections revealed the baseline to be consistently stable at 27.5 and the new area count to be holding.

Any idea what could have happened here?
Do you pressurize the eluent bottles with nitrogen ??
2 posts Page 1 of 1

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