Baseline problem in agilent GC

Discussions about GC and other "gas phase" separation techniques.

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We are analyzing one compound on Agilent 7890GC A and B with following GC condition.
Column : HP-5, 30m x 0.32mm ID x 0.25 micron film thickness.
Carrier gas : nitrogen (1.5 ml constant flow)
Injector : 250 (Split 100:1)
Detector : 280
Oven : 50 (2) ramp of 100 degree per minute up to 280 hold up to 10 minute.

main peak are eluting at 2.6minute and then baseline got disturbed up to 5 minute.
when we are analyzing same compound with same column on shimadzu 2010/varian 450 GC with all the same parameters we are getting one impurity at 4.3 minute and baseline which we are getting very good.

now I am not able to understand why the baseline disturbed on agilent GC.
Is there any injection technique variation in all the three GC due to that we are not able to get as we had check almost all the inlet parts of agilent GC but still we are not able to get the smooth base line.
IF anyone can help please suggest me where to look to get better baseline.
It would be helpful if you could post an image of what your baseline is doing. In the instructions at the top of this forum, you can read about how to do this.
2 posts Page 1 of 1

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